METHODS FOR PREPARING A TITANIUM OXIDE FILM AND A COMPOSITE FILM COMPRISING THE SAME
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United States of America Patent
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Issued Date -
Apr 28, 2016
app pub date -
Apr 21, 2015
filing date -
Oct 23, 2014
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Abandoned
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Abstract
The present invention relates to a method for preparing a titanium oxide film and a method for preparing a composite film comprising a titanium oxide film. Particularly, the present invention relates to a method for preparing the titanium oxide film which serves as a passivation layer for the oxide semiconductor. In the present method for preparing the passivation layer, a low-reactive metal alkoxide compound is used as a precursor to form the passivation layer by the atomic layer deposition. Therefore, the deterioration of the oxide semiconductor during the preparation process may be avoided.
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