TRANSISTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Apr 14, 2016
app pub date -
Oct 8, 2014
filing date -
Oct 8, 2014
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A method of manufacturing a transistor structure includes a step of implanting a light dosage into a substrate at a bit line junction and two cell side junctions, and a step of implanting a light dosage into the bit line junction an additional time. A uniform region having a substantially uniform dopant concentration is formed at the bit line junction. The dopant concentration of the uniform region is higher than that of the cell side junctions and higher than that of the region of the bit line junction under the uniform region.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully