SUBSTRATE PROCESSING APPARATUS
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United States of America Patent
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Issued Date -
Mar 31, 2016
app pub date -
Aug 31, 2015
filing date -
Sep 29, 2014
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A substrate processing apparatus includes a processing chamber configured to accommodate a substrate therein; a first processing gas supply part configured to supply a first processing gas to the substrate, the first processing gas supply part including a vaporizer configured to vaporize a first processing gas precursor into the first processing gas; a second processing gas supply part configured to supply a second processing gas to the substrate; a vaporizer remaining amount measuring part configured to measure a remaining amount of the first processing gas precursor within the vaporizer; and a control part configured to adjust a number of cycles for supplying the first processing gas and the second processing gas based on the remaining amount of the first processing gas precursor.
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