Heat treatment apparatus
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United States of America Patent
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Sep 27, 2016
Grant Date -
Mar 24, 2016
app pub date -
Jun 30, 2013
filing date -
May 31, 2013
priority date (Note) -
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Abstract
A heat treatment apparatus includes a hot plate, at least two heat sources, and a switching mechanism. The hot plate serves as the heating medium between the at least two heat sources and the substrate to be processed, the switching mechanism is configured in such a way that the hot plate contacts one or two of the at least two heat sources selectively, the processing temperature of the hot plate can be changed quickly from one temperature to another temperature.
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