CHEMICAL MECHANICAL POLISHING CONDITIONER WITH BRUSHES
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United States of America Patent
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Issued Date -
Mar 17, 2016
app pub date -
Aug 24, 2015
filing date -
Sep 11, 2014
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Provided is a CMP conditioner with brushes comprising: a substrate comprising a surface, multiple concave parts formed in the surface; multiple abrasive assemblies, each abrasive assembly comprising a metal bar and an abrasive particle, the metal bar comprising a connecting end and a dressing end, the abrasive particle mounted in the dressing end of the metal bar and protruding a tip, wherein vertical distances between the tips and a level of the surface are equal; and multiple brushes mounted in the surface, wherein ends of the brushes are higher than the tips, vertical distances between the ends of the brushes and a level of the tips ranging from 0.1 mm to 1 mm. The present invention, with precise control of the vertical distance between the tips and the level of the surface, and of the vertical distance between the ends of the brushes and a level of the tips improves the cleaning ability of the CMP conditioner with brushes for the scraps in holes of the surface of a pad and avoid problems, e.g., scraps in some holes cannot be effectively removed.
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