METHOD FOR FORMING METAL PATTERN AND SUBSTRATE HAVING THE SAME

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United States of America Patent

APP PUB NO 20160073508A1
SERIAL NO

14819432

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Abstract

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A method for forming a metal pattern on a substrate having at least one metal component is provided. By performing the surface passivation treatment on the at least metal component, the surface of the at least metal component becomes an anti-plating surface via an anti-plating coating. Hence, the metal pattern can be selectively formed in the following electroless plating processes.

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Patent Owner(s)

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WISTRON NEWEB CORP20 PARK AVENUE II HSINCHU SCIENCE PARK HSINCHU 308

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Jing-Wen Hsinchu, TW 4 5
Chen, Shih-Hong Hsinchu, TW 27 169
Chuang, Tzu-Wen Hsinchu, TW 5 9
Radi, Babak Hsinchu, TW 11 37

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