SYSTEM AND METHOD FOR SELECTING PATH ACCORDING TO SELECTION CONDITIONS

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United States of America Patent

APP PUB NO 20160061671A1
SERIAL NO

14470932

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Abstract

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An optical element stress aberration calculation system and method, where a stress distribution is obtained through a stress analysis and a light tracking technologies, and then a stress distribution generated by incident lights with different viewing angles is calculated, so that a stress aberration error is reduced.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL APPLIED RESEARCH LABORATORIES3F NO 106 HO-PING E RD SEC 2 TAIPEI CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHANG, Shenq-Tsong Taipei, TW 5 4
HSU, Ming-Ying Taipei, TW 1 0
HUANG, Ting-Ming Taipei, TW 7 12

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