STRUCTURE EQUIPPED WITH AMORPHOUS CARBON FILM HAVING ELECTRICALLY CONDUCTIVE PART AND CONTAINING SILICON, AND METHOD FOR MANUFACTURING SAME

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United States of America Patent

APP PUB NO 20160056455A1
SERIAL NO

14779152

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Abstract

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In a structure according to an embodiment, an electrically conductive part on an amorphous carbon film can be appropriately formed, and the region surrounding the electrically conductive part of the amorphous carbon film can have increased friction resistance and wear resistance. The structure includes a substrate and an amorphous carbon film containing Si formed on the substrate and irradiated with a laser beam to have an electrically conductive part modified to have electric conductivity.

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Patent Owner(s)

Patent OwnerAddress
TAIYO YUDEN CHEMICAL TECHNOLOGY CO LTD2947-1 KURAGANO-MACHI TAKASAKI-SHI GUNMA 370-1201

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shibusawa, Kunihiko Takasaki-shi, Gunma, JP 15 403

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