CYLINDRICAL SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME

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Issued Date
Feb 25, 2016
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Mar 27, 2014
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Mar 29, 2013

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Abstract

The cylindrical sputtering target is a Cu—Ga alloy cylindrical sputtering target made of a Cu alloy containing 15 atom % to 35 atom % of Ga, in which the Cu alloy has a granular crystal structure.

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MITSUBISHI MATERIALS CORPORATION	TOKYO

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Inventor Name	Address	# of filed Patents	Total Citations
Kato, Shinji	Sanda-shi, JP	237	2466
Komiyama, Shozo	Sanda-shi, JP	12	42
Zhang, Shoubin	Sanda-shi, JP	23	108

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CYLINDRICAL SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME

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United States of America Patent

14779603

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14779603

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