FRIT ENCAPSULATION APPARATUS
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United States of America Patent
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Issued Date -
Feb 25, 2016
app pub date -
Oct 29, 2014
filing date -
Aug 21, 2014
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Abstract
A frit encapsulation apparatus includes a carriage, a mask, a laser light source and a pressure element. The carriage is disposed over a first substrate. The mask is disposed in the carriage and has a light-transmitting region. The laser light source is disposed in the carriage and over the mask and is configured to provide laser light through the light-transmitting region of the mask and the first substrate therebeneath to heat the frit beneath the first substrate. The pressure element is disposed beneath the carriage and is configured to provide a pressure to the first substrate, such that the first substrate is adhered to a second substrate by the heated frit, in which the pressure element is not overlapped with a vertical projection of the light-transmitting region on the first substrate.
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