DISPLAYS HAVING REDUCED OPTICAL SENSITIVITY TO APERTURE ALIGNMENT AT STEPPER FIELD BOUNDARY
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United States of America Patent
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Feb 18, 2016
app pub date -
Aug 13, 2014
filing date -
Aug 13, 2014
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Abstract
Systems, methods and methods of manufacture for, among other things, a MEMS display that has a substrate with a first and a second array of apertures. The first and second arrays are, typically, formed on the substrate so that the arrays are adjacent and define a field boundary line that may extend between the two arrays and along a width of the substrate. In at least one array, the apertures that are proximate the field boundary line are placed at locations on the substrate to reduce differences in luminance between one portion of the display and another portion of the display.
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