METHOD AND APPARATUS FOR REMOVING RESIDUE LAYER
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United States of America Patent
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Feb 18, 2016
app pub date -
Aug 17, 2015
filing date -
Aug 18, 2014
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Abstract
A method of removing a residue layer formed on a side surface of each of a plurality of convex-shaped structure which stands together on a surface of a substrate or a side surface of a concave-shaped structure formed on the substrate, includes disposing an electrostatic lens between the substrate and a charged particle irradiation mechanism which linearly irradiates a beam of charged particles onto the substrate. The electrostatic lens diverges the beam of charged particles.
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