SCHOTTKY DIODE WITH BURIED LAYER IN GAN MATERIALS

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United States of America Patent

SERIAL NO

14923139

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Abstract

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A semiconductor structure includes a III-nitride substrate characterized by a first conductivity type and having a first side and a second side opposing the first side, a III-nitride epitaxial layer of the first conductivity type coupled to the first side of the III-nitride substrate, and a plurality of III-nitride epitaxial structures of a second conductivity type coupled to the III-nitride epitaxial layer. The semiconductor structure further includes a III-nitride epitaxial formation of the first conductivity type coupled to the plurality of III-nitride epitaxial structures, and a metallic structure forming a Schottky contact with the III-nitride epitaxial formation and coupled to at least one of the plurality of III-nitride epitaxial structures.

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Patent Owner(s)

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NEXGEN POWER SYSTEMS INC2010 EL CAMINO REAL SANTA CLARA TOWN CENTRE # 1048 SANTA CLARA CA 95050

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bour, David P Cupertino, US 159 2792
Brown, Richard J Los Gatos, US 76 730
Edwards, Andrew San Jose, US 41 488
Kizilyalli, Isik C San Francisco, US 145 1919
Nie, Hui Cupertino, US 97 729
Prunty, Thomas R Santa Clara, US 53 457
Romano, Linda Sunnyvale, US 61 646

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