BAFFLE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
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United States of America Patent
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Issued Date -
Feb 11, 2016
app pub date -
Aug 22, 2014
filing date -
Aug 6, 2014
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Abstract
Provided is a substrate treating apparatus including: a process chamber; a substrate support unit provided to support a substrate within the process chamber; a baffle positioned on the substrate support unit and formed with a plurality of injection holes; and a gas supply unit supplying a gas onto the baffle, wherein the baffle includes a slope region formed at an edge thereof and inclined such that the height of an upper surface thereof increases as it goes to an outer side surface.
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