Aberration computing device, aberration computing method, image processor, image processing method, and electron microscope

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United States of America Patent

PATENT NO 10332721
APP PUB NO 20160041064A1
SERIAL NO

14706308

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Abstract

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An aberration computing device (100) includes a fitting section (48) for fitting line profiles of a diffractogram taken in radial directions to a fitting function and finding fitting parameters of the fitting function and a computing section (49) for finding at least one of an amount of defocus and two-fold astigmatism, based on the fitting parameters.

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Patent Owner(s)

Patent OwnerAddress
JEOL LTD3-1-2 MUSASHINO AKISHIMA TOKYO 196-8558

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Morishita, Shigeyuki Tokyo, JP 16 23

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