APPARATUS AND METHOD TO FABRICATE MEMS DEVCE
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United States of America Patent
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Feb 11, 2016
app pub date -
Aug 8, 2014
filing date -
Aug 8, 2014
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Abstract
A MEMS device and fabrication of MEMS device is disclosed. The method includes providing a device layer, disposing a sacrificial layer over a first surface of the device layer, forming at least one MEMS feature in the device layer, wherein the formed MEMS feature is attached to the sacrificial layer. Selective portions of the sacrificial layer are removed so as to permit movement of the formed MEMS feature.
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