COMPACT AND LOW LOSS Y-JUNCTION FOR SUBMICRON SILICON WAVEGUIDE

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United States of America Patent

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14834597

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A compact, low-loss and wavelength insensitive Y-junction for submicron silicon waveguides. The design was performed using FDTD and particle swarm optimization (PSO). The device was fabricated in a 248 nm CMOS line. Measured average insertion loss is 0.28±0.02 dB across an 8-inch wafer. The device footprint is less than 1.2 μm×2 μm, orders of magnitude smaller than MMI and directional couplers.

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Patent OwnerAddress
NOKIA SOLUTIONS AND NETWORKS OYESPOO FINLAND ESPOO SOUTHERN FINLAND

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baehr-Jones, Thomas Wetteland Arcadia, US 59 242
Hochberg, Michael J New York, US 140 1799
Liu, Yang Elmhurst, US 1941 7962
Ma, Yangjin Brooklyn, US 57 391
Shi, Ruizhi New York, US 48 368
Yang, Shuyu Newark, US 15 135
Zhang, Yi Elkton, US 1881 15120

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