HIGH-THROUGHPUT PARTICLE PRODUCTION USING A PLASMA SYSTEM
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United States of America Patent
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app pub date -
Mar 12, 2014
filing date -
Aug 17, 2012
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Abstract
The present disclosure relates to a nanoparticle production system and methods of using the system. The nanoparticle production system includes a plasma gun including a male electrode, a female electrodes and a working gas supply configured to deliver a working gas in a vortexing helical flow direction across a plasma generation region. The system also includes a continuous feed system, a quench chamber, a cooling conduit that includes a laminar flow disruptor, a system overpressure module, and a conditioning fluid purification and recirculation system.
First Claim
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