COPPER PARTICULATE DISPERSION, CONDUCTIVE FILM FORMING METHOD, AND CIRCUIT BOARD

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United States of America Patent

APP PUB NO 20160029483A1
SERIAL NO

14769919

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Abstract

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To provide copper particulate dispersion capable of forming a conductive film having favorable adhesiveness on an inorganic substrate by photo-sintering. The copper particulate dispersion includes a dispersion vehicle and copper particulates RUM The copper particulates are dispersed into the dispersion vehicle. The copper particulate dispersion includes an adhesion improvement agent for improving adhesiveness between a conductive film formed on a substrate by photo-sintering the copper particulate and the substrate. The substrate is an inorganic substrate. The adhesion improvement agent is a compound containing a phosphorus atom. Thus, the adhesion improvement agent improves adhesiveness between the conductive film and the inorganic substrate.

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Patent Owner(s)

Patent OwnerAddress
ISHIHARA CHEMICAL CO LTDKOBE CITY HYOGO HYOGO DISTRICT XILIU HARAMACHI 5 NO 26

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ARIMURA, Hidetoshi Hyogo, JP 10 169
KAWATO, Yuichi Hyogo, JP 8 39
KUDO, Tomio Hyogo, JP 10 53

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