PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jan 28, 2016
app pub date -
Mar 10, 2014
filing date -
Mar 15, 2013
priority date (Note) -
Published
status (Latency Note)
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Abstract
One production method for semiconductor devices includes sequentially forming a stopper film and a BPSG film, forming a cylinder etch laminated mask upon the BPSG film, forming openings having a prescribed pattern in the cylinder etch laminated mask, then, using same as a mask, forming a cylinder hole that pierces from the BPSG film to the stopper film in the thickness direction. Next, forming a conductive layer that adjoins the side surfaces of the BPSG film, the stopper film, and a polysilicon film being part of the cylinder etch laminated mask, then removing the polysilicon film and the BPSG film .
First Claim
all claims..Other Claims data not available
Family
Country | kind | publication No. | Filing Date | Type | Sub-Type |
---|---|---|---|---|---|
WO | A1 | WO2014142253 | Mar 13, 2014 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
INTERNATIONAL APPLICATION PUBLISHED WITH INTERNATIONAL SEARCH REPORT | 半導体装置の製造方法 | Sep 18, 2014 | |||
KR | A | KR20150131145 | Mar 13, 2014 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
UNEXAMINED PATENT APPLICATION | 반도체 장치의 제조 방법 | Nov 24, 2015 | |||
TW | A | TW201507005 | Mar 14, 2014 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
LAID OPEN APPLICATION FOR PATENT OR PATENT OF ADDITION | Method of manufacturing semiconductor device | Feb 16, 2015 |
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
LONGITUDE SEMICONDUCTOR S A R L | 208 VAL DES BONS MALADES LUXEMBOURG L-2121 |
International Classification(s)

- 2014 Application Filing Year
- H01L Class
- 23828 Applications Filed
- 21803 Patents Issued To-Date
- 91.51 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Koge, Katsumi | Tokyo, JP | 11 | 18 |
# of filed Patents : 11 Total Citations : 18 |
Cited Art Landscape
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Patent Citation Ranking
- 2 Citation Count
- H01L Class
- 13.47 % this patent is cited more than
- 9 Age
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- No Forward Cites to Display

Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jul 28, 2027 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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