Photoresist composition and method of manufacturing substrate for display device by using the same

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United States of America Patent

PATENT NO 9851635
SERIAL NO

14801111

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Abstract

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A photoresist composition includes an alkali soluble resin, a hardening agent, a photo acid generator, and an organic solvent. The photo acid generator may be represented by Formula 1,

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Patent Owner(s)

Patent OwnerAddress
MERCK PATENT GMBHDARMSTADT FEDERAL REPUBLIC OF GERMANY DARMSTADT HESSIAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Jaehyuk Yongin, KR 8 15
Kang, Deokman Anseong-si, KR 1 0
Kang, Hoon Yongin, KR 143 741
Kim, Chadong Yongin, KR 10 75
Kim, Changhoon Yongin, KR 121 2266
Kim, Younsuk Anseong-si, KR 8 212
Lee, Hikuk Yongin, KR 6 18
Lee, Kibeom Yongin, KR 9 22
Oh, Saetae Anseong-si, KR 1 0
Park, Jungin Yongin, KR 17 46
Sung, Wooyong Yongin, KR 87 895
Yun, Sanghyun Yongin, KR 16 25

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