CARBON FILM FORMATION METHOD, AND CARBON FILM
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United States of America Patent
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Jan 21, 2016
app pub date -
Jan 30, 2014
filing date -
Feb 28, 2013
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Abstract
A carbon film formation method according to an exemplary embodiment includes supplying an aromatic hydrocarbon gas having a methyl group into a processing chamber that accommodates a workpiece; generating plasma of a noble gas in a plasma generating chamber that is isolated from the processing chamber by a shielding unit; supplying particles in the plasma into the processing chamber through an opening in the shielding unit; and irradiating the particles to the aromatic hydrocarbon gas to form a carbon film having a π-conjugated ring structure or a π-conjugated chain structure on the workpiece.
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