A RADIO FREQUENCY POWER DEVICE FOR IMPLEMENTING ASYMMETRIC SELF-ALIGNMENT OF THE SOURCE, DRAIN AND GATE AND THE PRODUCTION METHOD THEREOF
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United States of America Patent
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Issued Date -
Jan 14, 2016
app pub date -
Mar 25, 2014
filing date -
Mar 25, 2013
priority date (Note) -
Published
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Abstract
The present disclosure relates to the technical field of radio frequency power devices, and more specifically, to a radio frequency power device for implementing the self-position alignment of asymmetric source, drain and gate and the production method thereof. In the radio frequency power device for implementing asymmetric self-alignment of the source, drain and gate according to the present disclosure, gate sidewalls are utilized to implement the self-position alignment of the source, drain and gate, thereby reducing parameter drift of products; besides, the source and drain of the device can be formed by the alloying process, the iron implanting process or epitaxy process after formation of the gate since the gate is protected by the passivating layer, featuring a simple technological process while reducing the parasitic source-drain resistances and enhancing the electrical properties of the radio is frequency power device.
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
FUDAN UNIVERSITY | 200433 NO 220 HANDAN ROAD SHANGHAI YANGPU DISTRICT SHANGHAI CITY SHANGHAI CITY 200433 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Liu, Xiaoyong | Shanghai, CN | 111 | 562 |
# of filed Patents : 111 Total Citations : 562 | |||
Sun, Qingqing | Shanghai, CN | 42 | 238 |
# of filed Patents : 42 Total Citations : 238 | |||
Wang, Pengfei | Shanghai, CN | 172 | 398 |
# of filed Patents : 172 Total Citations : 398 | |||
Zhang, Wei | Shanghai, CN | 2625 | 19909 |
# of filed Patents : 2625 Total Citations : 19909 | |||
Zhou, Peng | Shanghai, CN | 284 | 6195 |
# of filed Patents : 284 Total Citations : 6195 |
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Patent Citation Ranking
- 2 Citation Count
- H01L Class
- 13.47 % this patent is cited more than
- 9 Age
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