Charged Particle Beam System
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United States of America Patent
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Issued Date -
Jan 14, 2016
app pub date -
Mar 25, 2015
filing date -
Mar 26, 2014
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A charged particle beam system has a charged particle beam source (110) for producing a charged particle beam (EB), a beam blanker (1) and a sample stage (130) on which a sample (S) is held. The sample (S) is irradiated with the beam (EB) passed through the beam blanker (1). The beam blanker (1) has a multistage deflector assembly (20) and a first apertured portion (30). Multiple stages of deflectors (20a, 20b, 20c) for deflecting the beam (EB) are arranged in the multistage deflector assembly (20). The first apertured portion (30) is disposed between the first stage of deflector (20a) and the second stage of deflector (20b) of the deflector assembly (20). The beam (EB) which has passed through the first aperture portion (30) after being deflected by the first stage of deflector (20a) is deflected back to an optical axis (OA) by the second and subsequent stages of deflectors (20a, 20b).
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