Microlithographic apparatus

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United States of America Patent

PATENT NO 9348234
APP PUB NO 20160011521A1
SERIAL NO

14845574

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Abstract

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A projection objective of a microlithographic projection apparatus has a wavefront correction device (42) comprising a mirror substrate (44; 44a, 44b) that has two opposite optical surfaces (46, 48), through which projection light passes, and a circumferential rim surface (50) extending between the two optical surfaces (46, 48). A first and a second optical system (OS1, OS2) are configured to direct first and second heating light (HL1, HL2) to different portions of the rim surface (50) such that at least a portion of the first and second heating light enters the mirror substrate (44; 44a, 44b). A temperature distribution caused by a partial absorption of the heating light (HL1, HL2) results in a refractive index distribution inside the mirror substrate (44; 44a, 44b) that corrects a wavefront error. At least the first optical system (OS1) comprises a focusing optical element (55) that focuses the first heating light in a focal area (56) such that the first heating light emerging from the focal area (56) impinges on the rim surface (50).

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHGERMANY COHEN OBERKOCHEN BADEN-WURTTEMBERG

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bittner, Boris Roth, DE 45 321
Iliew, Rumen Oberkochen, DE 4 22
Schneider, Sonja Oberkochen, DE 26 89
Schoemer, Ricarda Zusmarshausen, DE 19 51
von, Hodenberg Martin Oberkochen, DE 10 38
Wabra, Norbert Werneck, DE 58 344
Wagner, Hendrik Aalen, DE 38 729

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