PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX, COLOR FILTER AND METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY APPARATUS

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United States of America Patent

SERIAL NO

14864909

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Abstract

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A photosensitive resin composition capable of forming a black matrix having good adhesion and good hardness, a black matrix, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a hyperbranched polymer (D), a solvent (E), and a black pigment (F). The alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) represented by formula (1). The hyperbranched polymer (D) is formed by reacting a multi-mercapto compound and a multi-functional (meth)acrylate.

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Patent Owner(s)

Patent OwnerAddress
CHI MEI CORPORATION59-1 SAN CHIA JEN TE TAINAN CITY 71702

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chou, Hung-Chia Kaohsiung City, TW 4 5
Liao, Hao-Wei Kaohsiung City, TW 18 48

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