Atomic force microscope drying system and atomic force microscope
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United States of America Patent
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Sep 13, 2016
Grant Date -
Jan 7, 2016
app pub date -
Feb 19, 2015
filing date -
Jul 4, 2014
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Abstract
A drying system, which can be implemented in an atomic force microscopy (AFM) machine according to the invention, includes an elastomer having elasticity and disposed between an AFM scan head device and a platen to form a chamber. A sample supporting substrate is disposed in the chamber and for placement of a specimen. A gas inlet pipeline extends from an outside of the chamber to an inside of the chamber to introduce a drying gas into the chamber. A gas outlet pipeline extends from the inside of the chamber to the outside of the chamber to exhaust the drying gas out of the chamber. Using the mechanism of introducing and exhausting the drying gas can exhaust the moisture out of the chamber, so that the relative humidity (RH) is decreased below 5% and a constant internal pressure is held in the space to become stable.
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