PVD PROCESSING APPARATUS AND PVD PROCESSING METHOD
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United States of America Patent
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Issued Date -
Jan 7, 2016
app pub date -
Mar 3, 2014
filing date -
Mar 19, 2013
priority date (Note) -
Abandoned
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Abstract
A PVD processing apparatus and method capable of forming a composite coating having a coating thickness with excellent circumferential uniformity on an outer peripheral surface of a substrate. The PVD processing apparatus includes: a vacuum chamber; a revolving table revolving a plurality of substrates around an revolution axis in the vacuum chamber; a plurality of rotating tables rotating the substrates about their rotation axis parallel to the revolution axis on the revolution table; a plurality of types of targets provided radially outside the revolving table at circumferentially spaced positions; and a table rotating mechanism rotating the rotating table by an angle of 180° or more while the substrates passes through a region between two tangent lines drawn from a center of the target to an arc enveloping the rotating tables.
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