Test pattern for feature cross-sectioning
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United States of America Patent
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Jul 19, 2016
Grant Date -
Dec 31, 2015
app pub date -
Jun 27, 2014
filing date -
Jun 27, 2014
priority date (Note) -
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Abstract
A method includes forming a first plurality of instances of a first pattern on a substrate. The first pattern includes a plurality of features defining a first spacing between features in a first direction. The instances in the first plurality are offset from one another at least in a second direction other than the first direction. The substrate is cleaved along a cleavage line. At least a first critical dimension of a feature in the first plurality of instances intersected by the cleavage line is measured.
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