Surface-Passivated Mesoporous Structure Solar Cell
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United States of America Patent
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Issued Date -
Dec 31, 2015
app pub date -
Jun 30, 2014
filing date -
Jun 30, 2014
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Abandoned
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Abstract
A method is presented for forming a surface-passivated mesoporous-structured solar cell. The method provides a transparent substrate, and forms an overlying transparent conductive electrode. A non-mesoporous layer of a first metal oxide is formed overlying the transparent conductive electrode. A mesoporous structure is formed overlying the non-mesoporous layer of first metal oxide. The mesoporous structure includes a mesoporous layer of a second metal oxide over the first metal oxide layer, and coating the mesoporous layer of second metal oxide is a passivating semiconductor layer having a bandgap wider than the second metal oxide. A semiconductor absorber layer is formed overlying the mesoporous structure, which is made up of both organic and inorganic components. A hole-transport medium (HTM) layer is formed overlying the semiconductor absorber layer, which may be an organic material. A metal electrode overlies the HTM layer. Also provided is a surface-passivated mesoporous-structured solar cell and ambipolar material.
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