PLASMA DEVICE, CARBON THIN FILM MANUFACTURING METHOD AND COATING METHOD USING PLASMA DEVICE
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United States of America Patent
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Issued Date -
Dec 24, 2015
app pub date -
Jan 21, 2014
filing date -
Jan 22, 2013
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Abstract
A plasma device including a vacuum container, an arc-type evaporation source, a negative electrode member, a shutter, a power source, and a trigger electrode is described. The arc-type evaporation source is fixed to the side wall of the vacuum container so as to face the substrate. The negative electrode member is made from vitreous carbon having a protrusion and is mounted on the arc-type evaporation source. The power source applies a negative voltage to the arc-type evaporation source. The trigger electrode comes into contact with or separates away from the protrusion on the negative electrode member. A negative voltage is applied to the arc-type evaporation source, the trigger electrode is brought into contact with the protrusion on the negative electrode member, an arc discharge is generated, the shutter is opened, and a carbon thin film is formed on the substrate.
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