PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX AND APPLICATION THEREOF
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United States of America Patent
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Dec 24, 2015
app pub date -
Jun 2, 2015
filing date -
Jun 23, 2014
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Abstract
The present invention relates to a photosensitive resin composition for black matrix and an application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo-initiator (C), a solvent (D), a black pigment (E) and a fluorescent brightening agent (F). The aforementioned alkali-soluble resin (A) includes a resin having an unsaturated group (A-1), and the resin having the unsaturated group (A-1) is obtained by polymerizing a mixture, and the mixture comprises an epoxy compound having at least two epoxy groups (a-1-1) and a compound having at least one carboxylic group and at least one vinyl unsaturated group (a-1-2).
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