Image mask film scheme and method
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United States of America Patent
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Feb 28, 2017
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N/A
app pub date -
Aug 31, 2015
filing date -
Oct 11, 2012
priority date (Note) -
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Abstract
A system and method for repairing a photolithographic mask is provided. An embodiment comprises forming a shielding layer over an absorbance layer on a substrate. Once the shielding layer is in place, the absorbance layer may be repaired using, e.g., an e-beam process to initiate a reaction to repair a defect in the absorbance layer, with the shielding layer being used to shield the remainder of the absorbance layer from undesirable etching during the repair process.
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