LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
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United States of America Patent
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Issued Date -
Dec 17, 2015
app pub date -
Jun 11, 2015
filing date -
Jun 16, 2014
priority date (Note) -
Abandoned
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Abstract
There is provided a lithography apparatus advantageous in a process on a substrate, on which patterning has been performed thereby, that an external apparatus performs (in a succeeding step). The apparatus includes a controller and a transmitter. The controller extracts log information to be transmitted to the external apparatus that performs a process on the substrate, on which the patterning has been performed, among log information associated with the patterning. The transmitter transmits the extracted log information to the external apparatus.
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