SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
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United States of America Patent
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Dec 17, 2015
app pub date -
Jun 17, 2014
filing date -
Jun 17, 2014
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Abstract
A substrate processing apparatus includes a susceptor on which a substrate is placed, a processing chamber that accommodates the susceptor, a multi-wavelength light source that generates multi-wavelength light, a light absorption chamber partially comprising a transmission plate for allowing the multi-wavelength light to pass therethrough and configured to prevent a gas from accessing the processing chamber, an introducing pipe that introduces the gas into the light absorption chamber, and an exhaust pipe that exhausts the gas from the light absorption chamber, wherein the multi-wavelength light passes through the transmission plate, then passes through the light absorption chamber and reaches the substrate.
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