ION IMPLANTATION SOURCE WITH TEXTURED INTERIOR SURFACES
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United States of America Patent
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Issued Date -
Dec 10, 2015
app pub date -
Jun 10, 2014
filing date -
Jun 10, 2014
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Abandoned
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Abstract
An ion implementation system includes an ion source chamber having a textured surfaced to reduce surface film delamination on the interior walls of the ion source chamber. The residual stresses originated from the thermal expansion mismatch due to temperature changes and the tensile residual stress between film and the substrate (liners). The textured feature alters the width to thickness ratio so that it will peel off when it reaches its fracture tensile stress. The machine textures surface increases the mechanical interlocking of the film that builds up on the surface of the ion source chamber, which delays delamination and reduces the size of the resulting flake thereby reducing the likelihood that the flake will bridge a biased component to a ground reference surface and correspondingly increases the life of the ion source.
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