METHOD OF REMOVING PHOTORESIST, EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DISPLAY SUBSTRATE
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United States of America Patent
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Dec 3, 2015
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Jun 26, 2014
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Sep 26, 2013
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Abstract
A method of removing a photoresist, an exposure apparatus and a method of manufacturing a display substrate are disclosed. The method of removing a photoresist includes the following steps: exposing the photoresist (43) remaining on the substrate (41) after the substrate is subjected to a patterning process; and removing the exposed photoresist (45) by a developing process. In this way, the necessities for the stripping apparatus used in stripping process, the high power apparatus and the chemical gas both used in the ashing process can be eliminated, thereby reducing the equipment cost and production cost.
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