PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTIVE FILM AND ELEMENT HAVING THE PROTECTIVE FILM

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United States of America Patent

SERIAL NO

14825175

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Abstract

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A photosensitive polysiloxane composition including a nitrogen-containing heterocyclic compound (A), a polysiloxane (B), an o-naphthoquinone diazide sulfonate (C), and a solvent (D) is provided. The nitrogen-containing heterocyclic compound (A) is selected from the group consisting of compounds represented by formulas (1) to (4):

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Patent Owner(s)

Patent OwnerAddress
CHI MEI CORPORATION59-1 SAN CHIA JEN TE TAINAN CITY 71702

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shih, Chun-An Tainan City, TW 36 102
Wu, Ming-Ju Tainan City, TW 32 99

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