POLYGLYCOLIC ACID RESIN COMPOSITION
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United States of America Patent
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Issued Date -
Dec 3, 2015
app pub date -
Nov 14, 2013
filing date -
Nov 16, 2012
priority date (Note) -
Abandoned
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Abstract
A poly(glycolic acid) resin composition that contains a crystal nucleator suitable for promoting crystallization of a poly(glycolic acid) resin, has a high crystallization rate in comparison to the poly(glycolic acid) resin, and is capable of having higher molding processability and improving heat resistance. A poly(glycolic acid) resin composition including a poly(glycolic acid) resin and a crystal nucleator composed of a carboxylic acid derivative: B1-L1-A-L2-B2 [1] {wherein, A is a C1-6 alkylene group optionally having a substituent, or a divalent C6-10 aromatic group optionally having a substituent; B1 and B2 are each independently a C3-6 cycloalkyl group optionally having a substituent, or a C6-10 aromatic group optionally having a substituent; L1 and L2 are each independently —C(═O)NR1— (wherein, R1 is a hydrogen atom or a C1-6 alkyl group) or —C(═O)O—}.
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