SOLUTION OF POLYAMIDE FOR SENSOR ELEMENT

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United States of America Patent

APP PUB NO 20150344359A1
SERIAL NO

14724299

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Abstract

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This disclosure, viewed from one aspect, relates to a method for producing a sensor element, including the following steps (A) and (B):

    (A) applying a polyamide solution onto a base to form a polyamide film on the base; and(B) forming a sensor element on the surface of the polyamide film,wherein the base or the surface of the base is composed of glass or silicon wafer,wherein a polyamide of the polyamide solution has a constitutional unit represented by the following general formulae (I) and (II):

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Patent Owner(s)

Patent OwnerAddress
SUMITOMO BAKELITE COMPANY LIMITEDSHINAGAWA-KU TOKYO 140-0002
AKRON POLYMER SYSTEMS INC62 NORTH SUMMIT STREET AKRON OH 44308

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HARRIS, Frank W Boca Raton, US 87 2951
JING, Jiaokai Uniontown, US 34 134
KATAYAMA, Toshihiko Nishinomiya-shi, JP 27 142
KAWASAKI, Ritsuya Kobe-shi, JP 19 46
MAETANI, Takehiko Kawasaki-shi, JP 2 5
OKADA, Jun Kobe-shi, JP 100 999
SUN, Limin Copley, US 45 172
UMEDA, Hideo Kobe-shi, JP 28 54
ZHANG, Dong Uniontown, US 236 2031

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