Surfactants with lower CMC, and surfactant systems and detergents containing said surfactants
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 14, 2017
Grant Date -
Nov 26, 2015
app pub date -
Jul 30, 2015
filing date -
Feb 1, 2013
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The invention relates to surfactants of the formula (I), in which R1 stands for —H or —CH3; R2, R3, R4, R5, R6 independently stand for —H, —CH3, —CH2CH3, —CH2CH2CH3, —CH(CH3)2, —CH2CH2CH2CH3, —CH2CH(CH3)2, —CH(CH3)CH2CH3, —C(CH3)3, —OH, —OCH3, —OCH2CH3, —OCH2CH2CH3, —OCH(CH3)2, a linear or branched alkyl group containing 8 to 20 C atoms, or —SO3−X+; X+ stands for a monovalent cation or the nth part of an n-valent cation; exactly one radical R2, R3, R4, R5, R6 stands for —SO3−X+; and exactly one radical R2, R3, R4, R5, R6 stands for a linear or branched alkyl radical containing 8 to 20 C atoms.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully