GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SAME
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United States of America Patent
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Nov 19, 2015
app pub date -
Dec 20, 2013
filing date -
Dec 29, 2012
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Abstract
The present invention relates to a gas barrier film including: an inorganic layer which contains oxygen atoms; and an organic-inorganic mixed layer which contains silica (SiO2) formed on one surface of the inorganic layer. The inorganic layer has a first area that is adjacent to the organic-inorganic mixed layer; and a second area that is present below the first area in the thickness direction of the inorganic layer. The number of the oxygen (O) atoms in the first area is greater than the number of the oxygen atoms in the second area which is equal in volume to the first area. The gas barrier film is excellent in terms of gas barrier properties, flexibility, transparency, and crack prevention. In addition, the gas barrier film enables non-vacuum wet coating and is thus advantageous in shortening the manufacturing time.
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