PROCESS FOR PRODUCING THICK NANOSTRUCTURED FILMS OBTAINED FROM A BLOCK COPOLYMER COMPOSITION
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Jul 27, 2015
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Sep 9, 2013
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The present invention relates to a process for producing nanostructured films obtained from block copolymers exhibiting a dispersity index of between 1.1 and 2, limits included, without nanostructuring defects, on a surface, in order for this treated surface to be able to be used as masks for applications in microelectronics.
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