CMOS IMAGE SENSOR INCLUDING COLOR MICROLENS, AND METHOD FOR MANUFACTURING SAME
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United States of America Patent
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Issued Date -
Nov 12, 2015
app pub date -
Apr 24, 2013
filing date -
Nov 16, 2012
priority date (Note) -
Abandoned
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Abstract
The present invention relates to a CMOS image sensor including a color microlens, in which the color characteristics of a microlens are improved by replacing a microlens made of a transparent material with a material having characteristics similar to those of a color filter, and a manufacturing method thereof. In accordance with the CMOS image sensor including a color microlens and the manufacturing method thereof according to the present invention, color characteristics is improved. Since formation processes of a color filter and a microlens are performed at one time, additional processes for planarization and step difference adjustment are not necessary, so that an entire process is simplified. In the progress of light, since there is no interface between materials, reflection, refraction and the like are reduced, so that it is possible to increase light efficiency.
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