METHOD FOR PRODUCING A DIELECTRIC AND/OR BARRIER LAYER OR MULTILAYER ON A SUBSTRATE, AND DEVICE FOR IMPLEMENTING SAID METHOD
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Nov 12, 2015
app pub date -
Nov 27, 2013
filing date -
Nov 28, 2012
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
The present invention relates to the procedure for the preparation of barrier and/or dielectric layers on a substrate, characterized in that it comprises the following stages: (a) cleaning the substrate, (b) placing the substrate on a sample holder and the introduction thereof into a vacuum chamber, (c) dosage of said vacuum chamber with an inert gas and a reactive gas, (d) injection into the vacuum chamber of a volatile precursor that has at least one cation of the compound to be deposited, (e) activation of a radio frequency source and activation of at least one magnetron, (f) decomposition of the volatile precursor using plasma, the reaction between the cation of the volatile precursor and the reactive gas occurring at the same time that the reaction between the reactive gas contained in the plasma and the cation from the target by sputtering takes place, thus leading to the deposition of the film onto the substrate. The device for carrying out said method is also object of the invention.
First Claim
Other Claims data not available