Lithographic patterning of insulating or semiconducting solid state material in crystalline form
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United States of America Patent
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Issued Date -
Nov 12, 2015
app pub date -
May 15, 2015
filing date -
Nov 22, 2012
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Abandoned
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Abstract
A method for lithographic patterning of an insulating or semiconducting solid state material in crystalline form, said method comprising a step where said material is exposed to an amount of radiation which is sufficient to change its insulating or semiconducting state into a conducting state.
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