POLISHING COMPOSITION
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United States of America Patent
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Issued Date -
Nov 12, 2015
app pub date -
Oct 25, 2013
filing date -
Dec 28, 2012
priority date (Note) -
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Abstract
Provided is a polishing composition which can suppress scratches on the surface of a metal substrate as an object to be polished, while suppressing dishing of the metal substrate. Disclosed is a polishing composition including functional polishing particles and water, the functional polishing particles containing a surface-modifying group having, at one end, a functional group that suppresses dissolution of a metal substrate by adsorbing to the metal substrate, and metal oxide particles to which the surface-modifying group is immobilized.
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