Method for making diamond layers by CVD
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United States of America Patent
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Jul 12, 2022
Grant Date -
Nov 5, 2015
app pub date -
Dec 4, 2013
filing date -
Dec 12, 2012
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Abstract
A method of coating a non-refractory and/or non-planar substrate (8) with synthetic diamond material using a microwave plasma chemical vapour deposition (CVD) synthesis technique, the method comprising: forming a composite substrate assembly (1) comprising: a support substrate (2) comprising an upper surface; one or more electrically conductive refractory guards (6) disposed over the upper surface of the support substrate and extending to a height hg above the upper surface of the support substrate; and one or more non-refractory and/or non-planar substrates disposed over the upper surface of the support substrate and extending to a height hs above the upper surface of the support substrate, wherein the height hs is less than the height hg, wherein a difference in height hg−hs lies in a range 0.2 mm to 10 mm; placing the composite substrate assembly within a plasma chamber of a microwave plasma CVD reactor; feeding process gases into the plasma chamber including a carbon containing gas and a hydrogen containing gas; feeding microwaves in the plasma chamber to form a microwave plasma at a location over the composite substrate assembly; and growing synthetic diamond material on the one or more non-refractory and/or non-planar substrates.
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