Multi-Beam Tool for Cutting Patterns
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United States of America Patent
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N/A
Issued Date -
N/A
app pub date -
Apr 23, 2015
filing date -
Apr 25, 2014
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
In a charged-particle multi-beam processing apparatus for exposure of a target with a plurality of parallel particle-optical columns the beam shaping device of each column includes an aperture array device provided with at least one array of apertures. Each array of apertures comprises a multitude of apertures for defining the shape of a respective sub-beam which is then imaged onto the target. The apertures form the sub-beam into an oblong shape as seen along the direction of the beam, said oblong shape having a short and a long side, with the long side being at least the double of the short side. The oblong shape thus defined by the apertures is oriented traversing a line grid direction of a line pattern of the target. The apertures of different aperture arrays may have different shapes and/or different orientations.
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