POLISHING METHOD AND HOLDER
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United States of America Patent
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Issued Date -
Oct 29, 2015
app pub date -
Mar 27, 2015
filing date -
Apr 1, 2014
priority date (Note) -
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Abstract
A polishing method includes a polishing process of polishing a surface to be polished of an object by relatively rotating a holding fixture and a polishing pad with the surface to be polished of the object held on the holding fixture being pressed against and placed in contact with the polishing pad, while supplying a polishing composition onto the polishing pad. During the polishing process, the object held on the holding fixture turns around with the surface to be polished of the object facing the polishing pad to change the orientation of the object.
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